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Comparative study of ALD SiO2 thin films for optical applications

2016

Article

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Author(s): Pfeiffer, K. and Shestaeva, S. and Bingel, A. and Munzert, P. and Ghazaryan, L. and van Helvoirt, C. and Kessels, W. M. M. and Sanli, U. T. and Grévent, C. and Schütz, G. and Putkonen, M. and Buchanan, I. and Jensen, L. and Ristau, D. and Tünnermann, A. and Szeghalmi, A.
Journal: {Optical materials express}
Volume: 6
Number (issue): 2
Pages: 660--670
Year: 2016
Publisher: OSA

Department(s): Modern Magnetic Systems
Bibtex Type: Article (article)

Address: Washington, DC
DOI: 10.1364/OME.6.000660
Language: eng

BibTex

@article{escidoc:0071,
  title = {{Comparative study of ALD SiO2 thin films for optical applications}},
  author = {Pfeiffer, K. and Shestaeva, S. and Bingel, A. and Munzert, P. and Ghazaryan, L. and van Helvoirt, C. and Kessels, W. M. M. and Sanli, U. T. and Gr\'event, C. and Sch\"utz, G. and Putkonen, M. and Buchanan, I. and Jensen, L. and Ristau, D. and T\"unnermann, A. and Szeghalmi, A.},
  journal = {{Optical materials express}},
  volume = {6},
  number = {2},
  pages = {660--670},
  publisher = {OSA},
  address = {Washington, DC},
  year = {2016}
}